| FM 系列抛光粉 |
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| FM 系列产品是由高纯度 ( α型结构 ) 的氧化铝所组成，中心粒度由 2.5 微米至 0.05 微米共分五种等级，适用于各种软硬度的金属之研磨抛光。 |
TYPE |
平均粒径 |
包装 |
FM.NO1 |
2.5 |
500 C .C
0.5/ 1KG |
FM.NO2 |
2.0 |
FM.NO3 |
1.5 |
FM.NO4 |
1.0 |
FM.NO5 |
0.05 |
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| CEPOL 系列氧化铈抛光粉 |
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| CEPOL 系列抛光粉其成份为氧化铈，适用于玻璃的抛光，依不同的玻璃材质的磨耗度与软硬度区分为五种等级。 |
TAPE |
CEPOL 101 |
CEPOL 120 |
CEPOL 132 |
CEPOL 201 |
CEPOL 302 |
平均粒径 |
2.65 |
3.65 |
2.10 |
2.75 |
2.65 |
TREO |
70~76% |
73~78% |
55~65% |
55~65% |
55~65% |
CeO 2 /TR |
80~90% |
85~90% |
83~87% |
83~87% |
83~87% |
EO |
8.8 |
8.3 |
7.5 |
6.8 |
8.5 |
PH |
硬  软 |
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| SURFIN 系列抛光皮 |
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| SURFIN polishing pads are ideal for use in high precision polishing of all types of semiconductor
crystal materials, including silicon wafers, and also metals and glass. SURFIN has been designed to produce a super fine polished surface which is scratch-free, damage-free, and without defects of any kind. From the many types of polishing pads available, the exact type can be selected to match each job. The polishing pad can be chosen in the form of a roll or disk cut into made-to-order sizes. The product can also be ordered with a double-sided adhesive film attached to the back of the pad, for quick and easy installation. |
| specification of SURFIN Polishing Cloth |
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Standard thickness(mm)
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Hardness°
(SHORE-A)
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Apertwre
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Largest width
(mm)
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Used for |
Overall thickenss
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Fom layer |
SURFIN
XXX-5
|
1.30
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70±5
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1400
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Si(First, second polishing).
GaAs,(First polishing) LT,LN |
SURFIN
018-3
|
1.37±0.1
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0.45±0.09
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70±5
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ROUGH
|
1480
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Hard Disk(Ni-P, Al)
Si(Second polishing) |
SURFIN 0000
|
1.35±0.1
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0.43±0.09
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66±5
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FINE
|
1480
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Si(Finalpolishing) , Glass |
SURFIN 191
|
1.20±0.1
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0.46±0.06
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67±5
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FINE
|
1000
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GaAs(Final polishing), GaP |
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